Normal Incidence Scatterometry


Scatterometry is a critical dimension measurement technology used to precisely determine the dimensions on the semiconductor wafer that directly control the resulting performance of the integrated circuit devices. This non-destructive, NI-OCD measurement is compatible with the current 32nm and below manufacturing technology and extensible for future requirements in both photolithography and etch applications. Nanometrics’ scatterometry technology combines non-contact optical technology with extremely powerful data analysis software to provide highly accurate measurement results for line width, height and sidewall angles, resulting in a full 3D metrology system. This technology is available in both standalone and integrated platforms.