Optical Critical Dimension (OCD)

Nanometrics OCD technology is a patented critical dimension measurement technology used to precisely determine the dimensions on the semiconductor wafer that directly control the resulting performance of the integrated circuit devices. This non-destructive, OCD measurement technology is compatible with the current 90 nm manufacturing technology and can be extended below 65 nm for future requirements in both photolithography and etch applications.

OCD combines non-contact optical technology with extremely powerful data analysis software to provide highly accurate measurement results for line width, height and sidewall angles. This technology is available in both standalone and integrated platforms.