SOLUTIONS: INTEGRATED METROLOGY

Nanometrics Integrated Metrology solutions are designed for process control of advanced CMP, CVD, Etch and Lithography processes. The systems are fully compatible with Nanometric’s Standalone Film Thickness products, and provide an overall enhancement to fab productivity. Combined with closed loop control (CLC) and advanced process control (APC), Nanometrics Integrated Metrology solutions deliver significant fab yield enhancement and boost final semiconductor device performance.