Nanometrics ORION
Advanced 200/300 mm Overlay Control System

The Orion is based on Nanometrics’ Atlas platform and offers high throughput in excess of 180 WPH. The system utilizes a proprietary optical system to provide low total measurement uncertainty (TMU), enabling 1 nanometer, 3-sigma precision in overlay control applications. Orion’s live image metrology with proprietary digital image folding tolerates wide process variations and eliminates the possibility of flier data. Both attributes are crucial elements in attaining high yields in 200mm and 300mm volume production.

The Orion’s real-time auto-focusing provides optimal precision at maximum throughput and eliminates focus failure and added focus time. The system is enhanced by optimized measurement algorithms. Real-time registration, analysis and control software provides the fastest time-to-decision and supports simultaneous recipe creation and data review during wafer measurement.