Nanometrics FLX
Flexible Metrology System

The Nanometrics FLX is a flexible, cost-efficient, high throughput 300 mm standalone metrology system based on Nanometrics' proven integrated metrology solutions. The FLX is designed to support up to four integrated metrology modules simultaneously - the tool can mix-and-match any combination of modules to form a complete metrology solution for lithography, CMP, etch and CVD/deposition processes. This capability accelerates process development through parallel development of integrated metrology solutions. The system offers industry-leading throughput of 250-500 wafers fueled by dual multi-axis wafer-handling robots.