Caliper Mosaic™
Advanced 300mm Overlay Metrology System

The Caliper Mosaic is the latest in the successful Caliper range of overlay measurement tools.  Designed for 300mm wafers in the most advanced processes Caliper Mosaic builds on more than 25 years experience in overlay metrology to offer the most advanced overlay measurement solution available today.  Caliper Mosaic is designed to achieve the Total Measurement Uncertainty (TMU) needed for the very tight overlay budgets of double patterning lithography processes.  With an all-new optical design and fast, highly accurate wafer stage, these overlay TMU requirements are met for 32nm processes with extendibility to 22nm processes and beyond.

With full support for a wide range of measurement targets, including traditional bar-in-bar designs and advanced Blossom, micro-Blossom and in-chip targets, Caliper Mosaic offers the broadest range of measurement options.  The high density of information in Blossom targets produces the best TMU possible within the dimensions of a traditional overlay measurement target, while also enabling simultaneous measurements of up to fourteen litho steps to support double patterning and other multi-layer dependent processes.  The smaller microBlossom and in-chip targets allow the dense in-field sampling required to correct for higher order in-field overlay errors, whatever their source.  Nanometrics patented in-chip targets are the smallest overlay targets measurable with a traditional imaging overlay tool.

Incorporating an edge-grip robot and very low contact stage chuck, Caliper Mosaic meets the most demanding contamination requirements.  As part of the Nanometrics Lynx cluster metrology platform, Caliper Mosaic offers highest productivity with the best cost of ownership of any tool of its type.