NanoSpec 9200
Advanced 200mm Film Analysis System

The NanoSpec 9200 thin film measurement system provides DUV-visible spectroscopic reflectometry in a high throughput, small footprint platform for the highest level of equipment utilization and the most comprehensive analysis possible of film thickness and material optical constants. The system is capable of handling 150mm and 200mm wafers. This system builds on technologies from the NanoSpec 9000 integrated film thickness system to provide users with a compact tool with high wafer throughput. The NanoSpec 9200 provides IC manufacturers with the fastest, most reliable, compact and cost-effective tool available for volume production, featuring the latest generation spectroscopic reflectometer, flawless pattern recognition, auto-focus, and auto-positioning stage and robotic wafer handling capabilities. This workhorse system is capable of measuring 200 wafers per hour.