9010M
Integrated Metrology® Mask Metrology System

The 9010M is the first integrated optical critical dimension (OCD) metrology tool designed specifically for photomasks and reticles. The 9010M utilizes Nanometrics’ production-proven OCD metrology that enables non-destructive, real-time measurement and profiling of critical features on photomasks and reticles without the limitations and drawbacks associated with CD-SEM metrology. The system measures critical dimensions and profiles on a wide variety of grating structures after development inspection (ADI) and after etch inspection (AEI) of both etched chrome and chrome/quartz structures.

The metrology system is based upon the production-proven, normal incidence polarized spectroscopic reflectometry with UV-visible broadband illumination that optimizes the measurement for production throughput levels. The compact design of the 9010M allows for easy integration into other mask process equipment, and can also be used in a tabletop configuration for laboratory applications.