Milpitas, California. March 30, 2006.

Nanometrics Sues Nova Measuring Instruments for Patent Infringement

Nanometrics Incorporated (Nasdaq: NANO), a leading supplier of advanced integrated and standalone metrology equipment to the semiconductor industry, today announced that it has filed a complaint in the United States District Court for the Northern District of California against Nova Measuring Instruments Ltd. for infringing Nanometrics’ U.S. Patent Number Re. 34,783. The patent, “Method for Determining Absolute Reflectance of a Material in the Ultraviolet Range,” relates to Nanometrics’ ultraviolet reflectometry and optical critical dimension tools.

“Nanometrics pioneered the field of ultraviolet metrology for the semiconductor industry,” said John Heaton, President and CEO of Nanometrics. “We have invested extensively in this technology and have spent years developing these metrology tools for use by our customers. We intend to vigorously protect all of our intellectual property.”

About Nanometrics
Nanometrics is a leader in the design, manufacture and marketing of high-performance process control metrology systems used in semiconductor manufacturing. Nanometrics metrology systems measure various thin film properties, critical circuit dimensions and layer-to-layer circuit alignment (overlay) during various steps of the manufacturing process, enabling semiconductor and integrated circuit manufacturers to improve yields, increase productivity and lower their manufacturing costs. Nanometrics maintains its headquarters in Milpitas, California, and sales and service offices worldwide. Nanometrics is traded on the Nasdaq National Market under the symbol NANO. Nanometrics’ website is: http://www.nanometrics.com.

Contact:
Peter Gise
Nanometrics
408.435.9600