Press Releases
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Milpitas, California. September 28, 2004.
Nanometrics and Tokyo Electron Limited Agree to Coordinate Efforts Nanometrics, Inc., (Nasdaq: NANO), a Milpitas-based supplier of advanced metrology systems, today announced that Nanometrics and Tokyo Electron Limited (TEL)’s TEL/Timbre group will cooperate to deliver a fab-wide, production proven combination of hardware and software for complete optical critical dimension process control scatterometry solutions across all aspects of the semiconductor manufacturing process. The combined hardware and software platform offers complete flexibility and the fastest time-to-results to customers employing a standalone strategy, as well as those developing a fully integrated metrology strategy for advanced process control (APC). Together, the applications resources of Nanometrics and TEL/Timbre offer the most extensive knowledge of all practical uses for optical scatterometry across a wide range of semiconductor processes and applications, and unparalleled expertise in the use of this technology for lithography and etch applications. "Nanometrics production proven hardware technology, together with TEL/Timbre (ODP) software, offers the ‘best-of-breed’ process control metrology solution,” said John Heaton, president and CEO of Nanometrics. “This combination excels at measuring, characterizing and controlling the line-width, sidewall angle, height and profile of critical features on semiconductor devices and structures.” Optical digital profiling (ODP) translates diffracted, broadband light into accurate profiles of semiconductor device structures and their underlying films. Unlike CD-SEMs and X-SEMs, which require a vacuum wafer environment and are generally destructive, optical scatterometry is fast, non-invasive and non-destructive, and can be easily integrated into process tools.
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